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Nanopatterning - Global Strategic Business Report

Price:
USD $3,950.00
ISBN/SKU #:
GIA-MCP1532
Research Group:
Global Industry Analysts
Date of Publication:
July 2009
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Summary

This report analyzes the Global Market for Nanopatterning in Millions of US$. The market for “Nanopatterning” in this report is analyzed by the following technology types - Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, & Others), Scanning Probe Lithography, and Other.  Annual forecasts are provided for the period of 2005 through 2015. The report profiles 28 companies including many key and niche players worldwide such as Ambios Technology, Inc., AMO GmbH. EV Group, Hewlett-Packard Development Company, L.P., IMS Chips, International Business Machines Corp., Micro Resist Technology GmbH, Molecular Imprints, Inc., NanoInk, Inc., Nanonex Corp., NanoOpto Corp., NIL Technology, Obducat AB, Optomec, Inc., Sigma-Aldrich Corp., STMicroelectronics N.V., SUSS MicroTec AG, Toppan Photomasks, Inc., Transfer Devices, Inc., Veeco Instruments, Inc., and Vistec Semiconductor Systems GmbH.  Market data and analytics are derived from primary and secondary research. Company profiles are mostly extracted from URL research and reported select online sources.


TABLE OF CONTENTS


NANOPATTERNING  					MCP-1532
A GLOBAL STRATEGIC BUSINESS REPORT


                                             CONTENTS

  I. INTRODUCTION, METHODOLOGY & PRODUCT DEFINITIONS

      Study Reliability and Reporting Limitations                       I-1
      Disclaimers                                                       I-2
      Data Interpretation & Reporting Level                             I-3
       Quantitative Techniques & Analytics                              I-3
      Product Definitions and Scope of Study                            I-3
       Nanoimprint Lithography                                          I-3
        Hot Embossing                                                   I-4
        UV Nanoimprint Lithography                                      I-4
        Soft Lithography                                                I-4
        Others                                                          I-4
       Scanning Probe Nanolithography                                   I-4
       Others                                                           I-4


 II. EXECUTIVE SUMMARY

  1. INTRODUCTION                                                       II-1
      Current and Future Analysis                                       II-1
      Polymer Electronics to Propel Demand for Nanopatterning           II-2
      Semiconductor Industry Spending Cuts Unlikely to  Cause Major
       Impact                                                           II-2
      NIL - A Strong Contender                                          II-2

  2. NANOPATTERNING TECHNOLOGIES                                        II-3
      Introduction to Nanotechnology                                    II-3
       A Conceptual Definition                                          II-3
       What is Nanotechnology?                                          II-4
       Background                                                       II-4
       Leaving Conventional Size Behind                                 II-5
      Introduction to Nanopatterning                                    II-5
       Nanopatterning Technologies                                      II-6
        Nanoimprint Lithography                                         II-6
         Processes                                                      II-7
          Hot Embossing Lithography                                     II-7
          Ultraviolet Nanoimprint Lithography                           II-7
           Step-and-Repeat Nanoimprint Lithography                      II-8
            Step-and-Stamp Imprint Lithography                          II-8
            Step-and-Flash Imprint Lithography                          II-8
          Microcontact Printing                                         II-8
          Others                                                        II-9
           Soft-UV NIL                                                  II-9
           Combined Nanoimprint and Photolithography                    II-9
         Advantages                                                     II-10
         Limitations                                                    II-10
         Applications                                                   II-10
        Scanning Probe Nanolithography                                  II-10
         Dip-Pen Nanolithography                                        II-11
         Scanning Tunneling Microscopy                                  II-12
         Atomic Force Microscope-based Lithography                      II-12
         Scanning Probe Contact Printing                                II-13
         Nanografting                                                   II-13
          First Method: Nanoshaving                                     II-13
          Second Method: Nanopen Reader and Writer                      II-14
          Third Method: Vesicle Fusion                                  II-14
          Fourth Method: Meniscus Force Nanografting                    II-14
          Fifth Method: Cathodic Electrografting                        II-14
         Local Anodic Oxidation                                         II-14
         Constructive Nanolithography                                   II-14
        Nanostencil Lithography                                         II-15
         Drawbacks                                                      II-15
         Potential Applications                                         II-16
        Other Nanopatterning Technologies                               II-16
         Self-Assembled Monolayers                                      II-16
         Nanopatterning through Phase Separation of  Polymers           II-16
         Laser-based Particle Deposition                                II-17
         Sputtering                                                     II-17
         Roller Nanoimprint Lithography                                 II-17

  3. APPLICATION AREAS                                                  II-18
      Biological Applications                                           II-18
      Microfluidics                                                     II-18
      Electronic Devices                                                II-19
      Semiconductors                                                    II-19
       Optoelectronics                                                  II-19
       Integrated Circuits                                              II-19
      Nano-optics                                                       II-20
      Nanosensors                                                       II-21
       Potential Industry Requirements for Hot Embossing  Lithography   II-21
       Potential Industry Requirements for UV-NIL                       II-22

  4. RECENT INDUSTRY ACTIVITY                                           II-23
      NIL and IMS Announce Electron Beam Lithography  Collaboration     II-23
      NanoInk Establishes NanoStem Cell Division                        II-23
      Carl Zeiss Acquires Stake in Nanoscribe                           II-24
      Replisaurus Completes Smart Equipment Acquisition                 II-24
      Molecular Imprints Announces Next S-FIL Phase                     II-24
      Obducat Secures NIL Systems Orders                                II-25
      Obducat Wins Order to Supply NIL Systems to  Luxtaltek            II-25
      Heptagon Purchases IQ Aligner from EV Group                       II-26
      Molecular Imprints Secures Order for Imprio HD2200  from Fujitsu  II-26
      NanoInk Establishes NanoFabrication Systems Division              II-26
      API Nanotronics Acquires NanoOpto                                 II-26
      Western Digital Acquires Komag                                    II-27
      SUSS MicroTec and Philips Research Sign License  Agreement        II-27
      NanoInk Licenses DPN Technology from Arrowhead  Research          II-27
      JSR Micro and IBM Sign Joint Research Agreement                   II-27
      HP Licenses NIL Technology to Nanolithosolutions                  II-28
      CMJ and Obducat Sign NIL Equipment Distribution  Agreement        II-28
      NanoInk and Schmidt Scientific Reach Distribution  Agreement      II-28
      STMicroelectronics Orders Obducat’s NIL R&D  System               II-29
      Obducat Secures DSI Order for Eitre® NIL System                   II-29
      NanoInk Obtains Three Patents for Nanoscale  Manufacturing        II-29
      Ambios Technology Completes Quesant Instrument  Acquisition       II-30
      Silver River Ventures Acquires BioForce Nanosciences              II-30
      Bridgehead Group Acquires Major Interest in NIL  Technology       II-30
      NanoInk Signs Exclusive License Deal with  Georgia Tech           II-31
      Nanonex Wins Order from Sandia National for  Ultra-100            II-31
      DTU Establishes New Nanotech Unit                                 II-31
      Obducat Secures European Patent                                   II-31
      Obducat Wins US Patent for E-beam Lithography                     II-32
      Obducat to Secure US Patent for NIL                               II-32
      Obducat to Receive First Japanese Patent for NIL                  II-32
      Molecular Imprints Receives ‘Texas Emerging  Technology Fund’
       Grant                                                            II-32
      Leica Microsystems SED Changes Name to Vistec  Semiconductor
       Systems                                                          II-33
      Nanonex Delivers Nanoimprintor to University of  California       II-33
      Nanonex Delivers NIL System to Forschungszentrum                  II-33
      Golden Gate Acquires Leica Microsystems’  Semiconductor
       Equipment Division                                               II-33
      Toppan Printing Acquires DuPont Photomasks                        II-34
      Merck KGaA Acquires Covion Organic  Semiconductors                II-34
      Benchmark Signs Distribution Agreement with  Quantiscript         II-34
      University of Massachusetts to Set up Nanoimprint  Lithography
       Laboratory                                                       II-34
      EV Group Joins Hands with Komag to Develop NIL  Data Storage
       Application                                                      II-35

  5. PRODUCT LAUNCHES \ UPGRADES                                        II-36
      Transfer Devices Introduces New Tools for MxL  Processes          II-36
      Molecular Imprints Launches Imprio® HD 2200  System               II-36
      Molecular Imprints Introduces Imprio® 300 Patterning  Solution    II-36
      SUSS MicroTec Upgrades Manual Mask Aligners  with Nanoimprint
       Toolkit                                                          II-37
      Obducat Introduces New NIL System for High-Volume  Production     II-37
      Veeco Instruments Launches Innova SPM                             II-38
      Molecular Imprints Launches New Imprint  Lithography Tool         II-38
      Vistec Launches VB300 e-Beam Lithography Tool                     II-38
      Vistec Unveils New SB3050 for 32nm Technology  Node               II-39
      Veeco Unveils New NanoMan II Atomic Force  Microscope             II-39
      Molecular Imprints Unveils Imprio 250 NIL System                  II-39
      SUSS MicroTec Launches Nanopatterning Stepper                     II-40

  6. TECHNOLOGY DEVELOPMENTS                                            II-41
      Korean Scientists Develop New Nanopatterning  Technique           II-41
      Princeton University Researchers Develop Direct-Write
       Nanopatterning Technique                                         II-41
      API Nanotronics Develops Deep-Ultraviolet Polarizers              II-41
      S.E.T. and CEA Leti Develop FC300 High-Force  Device Bonder       II-42
      Georgia Institute Researchers Develop Nanolithography Technique   II-42
      ATDF Announces Innovative Nanopattern™ Test Wafer                 II-42
      US Scientists Use DNA Molecules as Nanolithography  Template      II-43
      AMO Researchers Demonstrate Nanoscale FinFETs  Using UV-NIL       II-43
      SUSS MicroTec and VTT Develop Nano Imprinting  Stepper            II-43
      Northwestern University Scientists Develops Advanced
       Nanopatterning Technique                                         II-44
      Louisiana Researchers Develop Patterning Method  for Nano-
       Assembled Thin Films                                             II-44
      Innos and NSI Develop Accurate Nanopatterning                     II-44

  7. RESEARCH & DEVELOPMENT INITIATIVES                                 II-45
      The Emerging Nanopatterning Methods (NAPA) Project                II-45
      NILCom                                                            II-46
      International Technology Roadmap for Semiconductors               II-46
       THE ITRS Lithography Roadmap                                     II-47
      Sematech Nanoimprint Lithography Program                          II-47

  8. FOCUS ON SELECT PLAYERS                                            II-48
      Ambios Technology, Inc. (USA)                                     II-48
      AMO GmbH (Germany)                                                II-48
      EV Group (Austria)                                                II-48
      Hewlett-Packard Development Company, L.P. (USA)                   II-48
      IMS Chips (USA)                                                   II-50
      International Business Machines Corp. (USA)                       II-50
      Micro Resist Technology GmbH (Germany)                            II-51
      Molecular Imprints, Inc. (USA)                                    II-51
      NanoInk, Inc. (USA)                                               II-51
      Nanonex Corp. (USA)                                               II-52
      NanoOpto Corp. (USA)                                              II-52
      NIL Technology (Denmark)                                          II-53
      Obducat AB (Sweden)                                               II-53
      Optomec, Inc. (USA)                                               II-53
      Sigma-Aldrich Corp. (USA)                                         II-54
      STMicroelectronics N.V. (Switzerland)                             II-54
      SUSS MicroTec AG (Germany)                                        II-55
      Toppan Photomasks, Inc. (USA)                                     II-55
      Transfer Devices, Inc. (USA)                                      II-56
      Veeco Instruments, Inc. (USA)                                     II-56
      Vistec Semiconductor Systems GmbH (Germany)                       II-56

  9. GLOBAL MARKET PERSPECTIVE                                          II-58
      Table 1: World Recent Past, Current & Future  Analysis for
      Nanopatterning by Technology Type -  Nanoimprint Lithography
      (Hot Embossing  Lithography, UV Nanoimprint Lithography,  Soft
      Lithography, and Others), Scanning  Probe Lithography, and
      Other Technologies  Markets Independently Analyzed with
      Annual Sales in US$ Million for  Years 2005 through 2015
      (includes  corresponding Graph/Chart)                             II-58

      Table 2: World 10-Year Perspective for Nanopatterning by
      Technology Type - Percentage Share Breakdown of Dollar Sales
      for Nanoimprint Lithography (Hot Embossing Lithography, UV
      Nanoimprint Lithography, Soft Lithography, and Others),
      Scanning Probe Lithography, and Other Markets for Years 2005,
      2010, and 2015 (includes corresponding Graph/Chart)               II-59

      Table 3: World Recent Past, Current & Future Analysis  for
      Nanopatterning Application in Semiconductor and  Other
      Microelectronic Devices with Annual Sales  in US$ Million for
      Years 2005 through 2015  (includes corresponding Graph/Chart)     II-60


III. COMPETITIVE LANDSCAPE

  Total Companies Profiled: 28 (including Divisions/Subsidiaries - 30 )

  -----------------------------------------
  Region/Country                    Players
  -----------------------------------------
  The United States                    14	  
  Canada                                1	 
  Japan                                 1
  Europe                               13
     France                             1 
     Germany                            5
     Rest of Europe                     7
  Asia-Pacific (Excluding Japan)        1
  -----------------------------------------


Additional Information

Number of Pages: 215

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