The global market for Nanopatterning Technology Equipment is projected to reach US$3.8 billion by 2022, driven by the development of new techniques such as 3D nanopatterning, and strong demand from end-use sectors such as nano-optics, biomedical electronics and electronic devices. The technology is especially used for producing complex 3-D structures and large area micro and/or nano scale patterns. In the electronics industry, growing production of flat screen TVs, mobile phones, cameras and palmtops will continue to fuel demand for nanopatterning of semiconductors. Nanoimprint Lithography (NIL) represents the largest market worldwide. Of the NIL technologies, UV nanoimprint lithography ranks as the fastest growing sub-sector with a CAGR of 24% over the analysis period. While semiconductor and other microelectronics applications represent the largest end-use for nanopatterning, other areas with strong growth potential include nano-optics, nanosensors, and microfluidics.
This report analyzes the Global market for Nanopatterning in US$ Thousand by the following Technology Types - Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, & Others), Scanning Probe Lithography, and Others. The Global market is also analyzed by the following End-Use Applications: Semiconductor & Other Microelectronics, and Others. Annual estimates and forecasts are provided for the period 2014 through 2020. Also, a seven-year historic analysis is provided for this market. Market data and analytics are derived from primary and secondary research. Company profiles are primarily based on public domain information including company URLs. The report profiles 35 companies including many key and niche players such as -
Canadian Photonics Fabrication Centre
Micro Resist Technology GmbH
TABLE OF CONTENTS
I. INTRODUCTION, METHODOLOGY & PRODUCT DEFINITIONS Study Reliability and Reporting Limitations I-1 Disclaimers I-2 Data Interpretation & Reporting Level I-2 Quantitative Techniques & Analytics I-2 Product Definitions and Scope of Study I-3 Nanoimprint Lithography I-3 Hot Embossing I-4 UV Nanoimprint Lithography I-4 Soft Lithography I-4 Others I-4 Scanning Probe Nanolithography I-4 Others I-4 II. EXECUTIVE SUMMARY 1. INDUSTRY OVERVIEW II-1 Nanotechnology - A Curtain Raiser II-1 Nanoscience - Breaking Conventional Size Barriers II-2 Nanotechnology Market Gathering Momentum II-2 Nanopatterning - A Prelude II-3 Market Outlook II-3 2. MARKET TRENDS & GROWTH DRIVERS II-5 Nanoimprint Lithography (NIL) - The Dominant Technology II-5 NIL Enables Cost-Effective Production of Photonics II-5 Expanding Applications Benefit Market Growth II-6 NIL Find Applications in the Nanophotonics Sector II-6 Soft UV-NIL - A Promising Technology II-7 NIL with a Soft Stamp II-8 Microcontact Printing - A Growing Market II-8 3D Nanopatterning - An Emerging Technique II-9 Development of Industrial Processes for Patterning Materials on Nanoscale II-9 Electronic Devices - A Major Market for Nanopatterning II-10 Demand for Nanopatterned Surfaces in Biomedical Applications II-11 Use of NanoGraft Technologies in Treatment of Coronary Artery Disease II-11 Growing Demand for Nanopatterning in Biological Applications II-12 Turing Nanopatterns in Insect Corneas to Shed Light on Formation of 3D Patterns in Living Organisms II-13 Demand from Nano-optics Boosts Nanopatterning Market II-13 Nanosensors - Opportunities in Store II-14 3. NANOPATTERNING TECHNOLOGIES II-15 A Peek into the World of Possibilities with Nanotechnology II-15 Enabling Technologies - Need of the Hour II-15 Introduction to Nanopatterning II-16 Nanopatterning Technologies II-17 Nanoimprint Lithography II-17 Applications II-18 Functionalities II-18 Advantages of Nanoimprint Lithography II-18 Elimination of Residual Coatings II-19 Effects of Proximity II-19 Unique 3D Patterning Ability II-19 Challenges II-20 Overlay Capability II-20 Defect Management II-20 Template Patterning II-20 Wearing of Imprint Templates II-20 NIL Processes - Types II-21 Application Areas for NIL II-21 Hot Embossing Lithography II-21 Potential Industry Requirements for Hot Embossing Lithography II-22 Ultraviolet Nanoimprint Lithography II-22 Step-and-Repeat Nanoimprint Lithography II-23 Step-and-Stamp Imprint Lithography II-23 Step-and-Flash Imprint Lithography II-23 Potential Industry Requirements for UV-NIL II-24 Soft Lithography / Microcontact Printing II-24 Types of Microcontact Printing (mCP) II-25 High-Speed mCP II-25 Submerged mCP II-25 Edge-Transfer Lithography II-25 Positive mCP II-25 Microdisplacement mCP II-26 Applications of Microcontact Printing II-26 DNA Patterning II-26 Cells Patterning II-26 Protein Patterning II-26 Micromachining II-26 Others II-27 Soft-UV NIL II-27 Photolithography II-27 Historical Background II-27 Fundamentals of Photolithography Procedure II-28 Combined Nanoimprint and Photolithography II-28 Advantages II-28 Limitations II-28 Scanning Probe Nanolithography II-28 Dip-Pen Nanolithography II-29 Applications of Dip-Pen Nanolithography II-30 Advantages and Disadvantages of Dip-Pen Nanolithography II-30 Scanning Tunneling Microscopy II-30 Atomic Force Microscope-based Lithography II-31 Scanning Probe Contact Printing II-32 Nanografting II-32 First Method: Nanoshaving II-32 Second Method: Nanopen Reader and Writer II-32 Third Method: Vesicle Fusion II-32 Fourth Method: Meniscus Force Nanografting II-33 Fifth Method: Cathodic Electrografting II-33 Local Anodic Oxidation II-33 Constructive Nanolithography II-33 Nanostencil Lithography II-33 Drawbacks II-35 Potential Applications II-35 Other Nanopatterning Technologies II-35 Self-Assembled Monolayers II-35 Nanopatterning through Phase Separation of Polymers II-36 Laser-based Particle Deposition II-36 Sputtering II-36 Roller Nanoimprint Lithography II-37 Select End-Use Applications II-38 Biological Applications II-38 Microfluidics II-38 Electronic Devices II-38 Semiconductors II-39 Optoelectronics II-39 Integrated Circuits II-39 Semiconductor Fabrication - Fusion of Nanoimprint Technology and Defect Management II-40 Nano-optics II-40 Nanosensors II-41 4. TECHNOLOGY DEVELOPMENTS II-42 Unconventional Lithography for 3D Hierarchical Nanostructures- Recent Developments II-42 Processes of Functional Structures with Patterns II-42 Unconventional Top-down Lithography II-42 Unconventional Bottom-up Lithography II-43 Block Copolymer Lithography II-43 Unconventional Lithography and Top-down Approaches for 3D Hierarchical Nano- and Micro-Structures II-44 Two-Step Photolithography II-44 Sequential Thermal Nanoimprint Lithography (t-NIL) II-44 Vacuum-Assisted CFL to Fabricate 3D Hierarchical Bridge Structures II-45 Applications Using 3D Hierarchical Structure II-45 Directional Wetting and Scattering on Hierarchical Patterns II-45 Dry Adhesive with Hierarchical Structures II-45 Free Standing Polymeric Membrane II-46 Integrating Assembly II-46 Self-Assembly of Spherical Colloids II-46 Fabrication 3D Porous Inverse Opal Structure II-47 Nano-imprint DSA of Block Copolymers II-47 Nanotransfer Printing through DSA of Block Copolymers II-47 Self-Assembly of BCPs with High-Resolution Patterning II-47 Integrating Assembly Applications II-48 Colloid-Based Photoluminescent Microtags II-48 Fabrication of Sub-10 nm Scale Graphene Nanoribbon Transistor II-48 Multiscale Porous Nanocolander Network with Tunable Transport Properties II-48 3D Structures’ Direct Patterning through Nanoimprint Lithography II-49 New NIL Technique to Improve Ordering in Periodic Arrays from BCPs II-50 New Generation Metamaterials II-50 Innovative Magnetic Nanopatterns II-50 NIL Makes Solar Cells with Higher Conversion Efficiency II-50 Hair Coloring with Nanopatterning II-51 High-Speed Roll-to-Roll Technology for Imprinting II-51 Rolith Develops New Nanopatterning Technology II-51 ALD - An Enabling Technology in Advanced Nanopatterning II-52 Nanopatterned Surfaces for Highly Selective Adhesion, Separation and Sensing II-52 Resist-Free Direct Thermal NIL Process II-53 3D Nanoparticle Patterning via Direct Incident Beam Lithography - A Technology to Reckon with II-53 Fabrication of Single Crystal Oxide Surface using Focused-Ion- Beam System - A Novel Approach in Nanopatterning II-54 Thermal Dip Pen Lithography for Depositing Nanoparticles II-54 Nanopatterning Using Phase Separation of Polymers II-54 Innovations in Surface Wrinkling II-55 5. RESEARCH & DEVELOPMENT INITIATIVES II-56 The Emerging Nanopatterning Methods (NAPA) Project II-56 NILCom II-56 International Technology Roadmap for Semiconductors II-57 Table 1: THE ITRS Lithography Roadmap (includes corresponding Graph/Chart) II-57 Sematech Nanoimprint Lithography Program II-58 6. PRODUCT LAUNCHES / INNOVATIONS II-59 EV Group Introduces EVG 7200 LA SmartNIL System for Display Panel Manufacturing II-59 Leti and EVG Unveil INSPIRE Lithography Program II-59 EVG Launches New Hercules Lithography System II-59 NIL Technology Introduces CNI v2.0, Next Generation of Compact Nanoimprint Tool for UV and Thermal Imprint, and Imprint in Vacuum II-59 Obducat Unveils Sindre G2 Nano-Imprint Litho System II-59 EVG Launches EVG 570R2R Roll-to-Roll NIL Tool II-59 EVG Unveils EVG720 Automated UV-NIL System II-60 EVG Launches EVG PHABLE™ Exposure System II-60 7. RECENT INDUSTRY ACTIVITY II-61 EV Group and JOANNEUM RESEARCH Collaborate for R&D Activities in Large-Area Nanoimprinting II-61 EV Group Supplies EVG HERCULES® Lithography Track System to WIKA Group for Manufacturing Pressure Sensor Devices II-61 Obducat Signs Agreement with a Display Manufacturer Regarding Evaluation of NIL Technology for Large Area II-61 DNP to Establish New Nanoimprint-Based Ultra-Micro Machining Business II-61 Canon to Develop Next Generation Lithography System II-61 Toshiba Partners with SK hynix for NIL Systems II-61 SUSS MicroTec Inks with Singh Center for Nanotechnology for NIL II-62 Canon Takes Over Molecular Imprints II-62 EVG Establishes NILPhotonics Competence Center II-62 EV Group Launches New SmartNIL II-62 8. FOCUS ON SELECT PLAYERS II-63 AMO GmbH (Germany) II-63 Canadian Photonics Fabrication Centre (Canada) II-63 EV Group (Austria) II-63 IMS Chips (Germany) II-64 Micro Resist Technology GmbH (Germany) II-64 Molecular Imprints, Inc. (US) II-65 Nanonex Corp. (US) II-65 NanoOpto Corp. (US) II-65 Nano-Terra, Inc. (US) II-66 NIL Technology ApS (Denmark) II-66 NTT Advanced Technology Corporation (Japan) II-66 Obducat AB (Sweden) II-67 PROFACTOR GmbH (Austria) II-67 SET Corporation SA (France) II-67 Sigma-Aldrich Corp. (US) II-68 SUSS MicroTec AG (Germany) II-68 SVG Optronics Co., Ltd. (China) II-69 Toppan Photomasks, Inc. (US) II-69 Transfer Devices, Inc. (US) II-69 Vistec Electron Beam GmbH (Germany) II-70 9. GLOBAL MARKET PERSPECTIVE II-71 Table 2: World Recent Past, Current & Future Analysis for Nanopatterning by Technology Type - Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, and Others), Scanning Probe Lithography, and Other Technologies Markets Independently Analyzed with Annual Sales in US$ Thousands for Years 2015 through 2022 (includes corresponding Graph/Chart) II-71 Table 3: World Historic Review for Nanopatterning by Technology Type - Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, and Others), Scanning Probe Lithography, and Other Technologies Markets Independently Analyzed with Annual Sales in US$ Thousands for Years 2009 through 2014 (includes corresponding Graph/Chart) II-72 Table 4: World 14-Year Perspective for Nanopatterning by Technology Type - Percentage Share Breakdown of Dollar Sales for Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, and Others), Scanning Probe Lithography, and Other Technologies Markets for Years 2009, 2016, and 2022 (includes corresponding Graph/Chart) II-73 Table 5: World Recent Past, Current & Future Analysis for Nanopatterning by End-Use Application - Semiconductor & Other Microelectronics, and Other End-Use Application Markets Independently Analyzed with Annual Sales in US$ Thousands for Years 2015 through 2022 (includes corresponding Graph/Chart) II-74 Table 6: World Historic Review for Nanopatterning by End-Use Application - Semiconductor & Other Microelectronics, and Other End-Use Application Markets Independently Analyzed with Annual Sales in US$ Thousands for Years 2009 through 2014 (includes corresponding Graph/Chart) II-75 Table 7: World 14-Year Perspective for Nanopatterning by End-Use Application - Percentage Breakdown of Dollar Sales for Semiconductor & Other Microelectronics, and Other End-Use Application Markets for Years 2009, 2016, and 2022 (includes corresponding Graph/Chart) II-76 III. COMPETITIVE LANDSCAPE Total Companies Profiled: 35 (including Divisions/Subsidiaries - 37) The United States (10) Canada (1) Japan (6) Europe (17) - France (2) - Germany (7) - Spain (1) - Rest of Europe (7) Asia-Pacific (Excluding Japan) (2) Middle East (1)