Nanopatterning Market

Nanopatterning - Global Strategic Business Report

Global Industry Analysts, Date of Publication: Jun 20, 2016, 139 Pages
US$4,500.00
GIA-MCP1532

Nanopatterning Market - Global Strategic Business Report

The global market for Nanopatterning Technology Equipment is projected to reach US$3.8 billion by 2022, driven by the development of new techniques such as 3D nanopatterning, and strong demand from end-use sectors such as nano-optics, biomedical electronics and electronic devices. The technology is especially used for producing complex 3-D structures and large area micro and/or nano scale patterns. In the electronics industry, growing production of flat screen TVs, mobile phones, cameras and palmtops will continue to fuel demand for nanopatterning of semiconductors. Nanoimprint Lithography (NIL) represents the largest market worldwide. Of the NIL technologies, UV nanoimprint lithography ranks as the fastest growing sub-sector with a CAGR of 24% over the analysis period. While semiconductor and other microelectronics applications represent the largest end-use for nanopatterning, other areas with strong growth potential include nano-optics, nanosensors, and microfluidics.

This report analyzes the Global market for Nanopatterning in US$ Thousand by the following Technology Types - Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, & Others), Scanning Probe Lithography, and Others. The Global market is also analyzed by the following End-Use Applications: Semiconductor & Other Microelectronics, and Others. Annual estimates and forecasts are provided for the period 2014 through 2020. Also, a seven-year historic analysis is provided for this market. Market data and analytics are derived from primary and secondary research. Company profiles are primarily based on public domain information including company URLs. The report profiles 35 companies including many key and niche players such as -

AMO GmbH
Canadian Photonics Fabrication Centre
EV Group
IMS Chips
Micro Resist Technology GmbH


TABLE OF CONTENTS

 I. INTRODUCTION, METHODOLOGY & PRODUCT DEFINITIONS

      Study Reliability and Reporting Limitations                       I-1
      Disclaimers                                                       I-2
      Data Interpretation & Reporting Level                             I-2
       Quantitative Techniques & Analytics                              I-2
      Product Definitions and Scope of Study                            I-3
       Nanoimprint Lithography                                          I-3
        Hot Embossing                                                   I-4
        UV Nanoimprint Lithography                                      I-4
        Soft Lithography                                                I-4
        Others                                                          I-4
       Scanning Probe Nanolithography                                   I-4
       Others                                                           I-4


 II. EXECUTIVE SUMMARY

  1. INDUSTRY OVERVIEW                                                  II-1
      Nanotechnology - A Curtain Raiser                                 II-1
       Nanoscience - Breaking Conventional Size Barriers                II-2
       Nanotechnology Market Gathering Momentum                         II-2
      Nanopatterning - A Prelude                                        II-3
      Market Outlook                                                    II-3

  2. MARKET TRENDS & GROWTH DRIVERS                                     II-5
      Nanoimprint Lithography (NIL) - The Dominant Technology           II-5
       NIL Enables Cost-Effective Production of Photonics               II-5
       Expanding Applications Benefit Market Growth                     II-6
       NIL Find Applications in the Nanophotonics Sector                II-6
      Soft UV-NIL - A Promising Technology                              II-7
       NIL with a Soft Stamp                                            II-8
      Microcontact Printing - A Growing Market                          II-8
      3D Nanopatterning - An Emerging Technique                         II-9
      Development of Industrial Processes for Patterning Materials
       on Nanoscale                                                     II-9
      Electronic Devices - A Major Market for Nanopatterning            II-10
      Demand for Nanopatterned Surfaces in Biomedical Applications      II-11
       Use of NanoGraft Technologies in Treatment of Coronary Artery
        Disease                                                         II-11
      Growing Demand for Nanopatterning in Biological Applications      II-12
       Turing Nanopatterns in Insect Corneas to Shed Light on
        Formation of 3D Patterns in Living Organisms                    II-13
      Demand from Nano-optics Boosts Nanopatterning Market              II-13
      Nanosensors - Opportunities in Store                              II-14

  3. NANOPATTERNING TECHNOLOGIES                                        II-15
      A Peek into the World of Possibilities with Nanotechnology        II-15
       Enabling Technologies - Need of the Hour                         II-15
      Introduction to Nanopatterning                                    II-16
      Nanopatterning Technologies                                       II-17
       Nanoimprint Lithography                                          II-17
        Applications                                                    II-18
        Functionalities                                                 II-18
        Advantages of Nanoimprint Lithography                           II-18
         Elimination of Residual Coatings                               II-19
         Effects of Proximity                                           II-19
         Unique 3D Patterning Ability                                   II-19
        Challenges                                                      II-20
         Overlay Capability                                             II-20
         Defect Management                                              II-20
         Template Patterning                                            II-20
         Wearing of Imprint Templates                                   II-20
        NIL Processes - Types                                           II-21
        Application Areas for NIL                                       II-21
        Hot Embossing Lithography                                       II-21
         Potential Industry Requirements for Hot Embossing Lithography  II-22
        Ultraviolet Nanoimprint Lithography                             II-22
         Step-and-Repeat Nanoimprint Lithography                        II-23
         Step-and-Stamp Imprint Lithography                             II-23
         Step-and-Flash Imprint Lithography                             II-23
         Potential Industry Requirements for UV-NIL                     II-24
        Soft Lithography / Microcontact Printing                        II-24
         Types of Microcontact Printing (mCP)                           II-25
          High-Speed mCP                                                II-25
          Submerged mCP                                                 II-25
          Edge-Transfer Lithography                                     II-25
          Positive mCP                                                  II-25
          Microdisplacement mCP                                         II-26
         Applications of Microcontact Printing                          II-26
          DNA Patterning                                                II-26
          Cells Patterning                                              II-26
          Protein Patterning                                            II-26
          Micromachining                                                II-26
        Others                                                          II-27
         Soft-UV NIL                                                    II-27
         Photolithography                                               II-27
          Historical Background                                         II-27
          Fundamentals of Photolithography Procedure                    II-28
         Combined Nanoimprint and Photolithography                      II-28
          Advantages                                                    II-28
          Limitations                                                   II-28
       Scanning Probe Nanolithography                                   II-28
        Dip-Pen Nanolithography                                         II-29
         Applications of Dip-Pen Nanolithography                        II-30
         Advantages and Disadvantages of Dip-Pen Nanolithography        II-30
        Scanning Tunneling Microscopy                                   II-30
        Atomic Force Microscope-based Lithography                       II-31
        Scanning Probe Contact Printing                                 II-32
        Nanografting                                                    II-32
         First Method: Nanoshaving                                      II-32
         Second Method: Nanopen Reader and Writer                       II-32
         Third Method: Vesicle Fusion                                   II-32
         Fourth Method: Meniscus Force Nanografting                     II-33
         Fifth Method: Cathodic Electrografting                         II-33
        Local Anodic Oxidation                                          II-33
        Constructive Nanolithography                                    II-33
       Nanostencil Lithography                                          II-33
        Drawbacks                                                       II-35
        Potential Applications                                          II-35
       Other Nanopatterning Technologies                                II-35
        Self-Assembled Monolayers                                       II-35
        Nanopatterning through Phase Separation of Polymers             II-36
        Laser-based Particle Deposition                                 II-36
        Sputtering                                                      II-36
        Roller Nanoimprint Lithography                                  II-37
      Select End-Use Applications                                       II-38
       Biological Applications                                          II-38
       Microfluidics                                                    II-38
       Electronic Devices                                               II-38
       Semiconductors                                                   II-39
        Optoelectronics                                                 II-39
        Integrated Circuits                                             II-39
        Semiconductor Fabrication - Fusion of Nanoimprint Technology
         and Defect Management                                          II-40
       Nano-optics                                                      II-40
       Nanosensors                                                      II-41

  4. TECHNOLOGY DEVELOPMENTS                                            II-42
      Unconventional Lithography for 3D Hierarchical Nanostructures- 
       Recent Developments                                              II-42
       Processes of Functional Structures with Patterns                 II-42
        Unconventional Top-down Lithography                             II-42
        Unconventional Bottom-up Lithography                            II-43
        Block Copolymer Lithography                                     II-43
       Unconventional Lithography and Top-down Approaches for 3D
        Hierarchical Nano- and Micro-Structures                         II-44
        Two-Step Photolithography                                       II-44
        Sequential Thermal Nanoimprint Lithography (t-NIL)              II-44
        Vacuum-Assisted CFL to Fabricate 3D Hierarchical Bridge
         Structures                                                     II-45
       Applications Using 3D Hierarchical Structure                     II-45
        Directional Wetting and Scattering on Hierarchical Patterns     II-45
        Dry Adhesive with Hierarchical Structures                       II-45
        Free Standing Polymeric Membrane                                II-46
       Integrating Assembly                                             II-46
        Self-Assembly of Spherical Colloids                             II-46
        Fabrication 3D Porous Inverse Opal Structure                    II-47
        Nano-imprint DSA of Block Copolymers                            II-47
        Nanotransfer Printing through DSA of Block Copolymers           II-47
        Self-Assembly of BCPs with High-Resolution Patterning           II-47
       Integrating Assembly Applications                                II-48
        Colloid-Based Photoluminescent Microtags                        II-48
        Fabrication of Sub-10 nm Scale Graphene Nanoribbon Transistor   II-48
        Multiscale Porous Nanocolander Network with Tunable
         Transport Properties                                           II-48
      3D Structures’ Direct Patterning through Nanoimprint Lithography  II-49
      New NIL Technique to Improve Ordering in Periodic Arrays from
       BCPs                                                             II-50
      New Generation Metamaterials                                      II-50
      Innovative Magnetic Nanopatterns                                  II-50
      NIL Makes Solar Cells with Higher Conversion Efficiency           II-50
      Hair Coloring with Nanopatterning                                 II-51
      High-Speed Roll-to-Roll Technology for Imprinting                 II-51
      Rolith Develops New Nanopatterning Technology                     II-51
      ALD - An Enabling Technology in Advanced Nanopatterning           II-52
      Nanopatterned Surfaces for Highly Selective Adhesion,
       Separation and Sensing                                           II-52
      Resist-Free Direct Thermal NIL Process                            II-53
      3D Nanoparticle Patterning via Direct Incident Beam
       Lithography - A Technology to Reckon with                        II-53
      Fabrication of Single Crystal Oxide Surface using Focused-Ion-
       Beam System - A Novel Approach in Nanopatterning                 II-54
      Thermal Dip Pen Lithography for Depositing Nanoparticles          II-54
      Nanopatterning Using Phase Separation of Polymers                 II-54
      Innovations in Surface Wrinkling                                  II-55

  5. RESEARCH & DEVELOPMENT INITIATIVES                                 II-56
      The Emerging Nanopatterning Methods (NAPA) Project                II-56
      NILCom                                                            II-56
      International Technology Roadmap for Semiconductors               II-57
       Table 1: THE ITRS Lithography Roadmap (includes corresponding
       Graph/Chart)                                                     II-57
      Sematech Nanoimprint Lithography Program                          II-58

  6. PRODUCT LAUNCHES / INNOVATIONS                                     II-59
      EV Group Introduces EVG 7200 LA SmartNIL System for Display
       Panel Manufacturing                                              II-59
      Leti and EVG Unveil INSPIRE Lithography Program                   II-59
      EVG Launches New Hercules Lithography System                      II-59
      NIL Technology Introduces CNI v2.0, Next Generation of Compact
       Nanoimprint Tool for UV and Thermal Imprint, and Imprint in
        Vacuum                                                          II-59
      Obducat Unveils Sindre G2 Nano-Imprint Litho System               II-59
      EVG Launches EVG 570R2R Roll-to-Roll NIL Tool                     II-59
      EVG Unveils EVG720 Automated UV-NIL System                        II-60
      EVG Launches EVG PHABLE™ Exposure System                          II-60

  7. RECENT INDUSTRY ACTIVITY                                           II-61
      EV Group and JOANNEUM RESEARCH Collaborate for R&D Activities
       in Large-Area Nanoimprinting                                     II-61
      EV Group Supplies EVG HERCULES® Lithography Track System to
       WIKA Group for Manufacturing Pressure Sensor Devices             II-61
      Obducat Signs Agreement with a Display Manufacturer Regarding
       Evaluation of NIL Technology for Large Area                      II-61
      DNP to Establish New Nanoimprint-Based Ultra-Micro Machining
       Business                                                         II-61
      Canon to Develop Next Generation Lithography System               II-61
      Toshiba Partners with SK hynix for NIL Systems                    II-61
      SUSS MicroTec Inks with Singh Center for Nanotechnology for NIL   II-62
      Canon Takes Over Molecular Imprints                               II-62
      EVG Establishes NILPhotonics Competence Center                    II-62
      EV Group Launches New SmartNIL                                    II-62

  8. FOCUS ON SELECT PLAYERS                                            II-63
      AMO GmbH (Germany)                                                II-63
      Canadian Photonics Fabrication Centre (Canada)                    II-63
      EV Group (Austria)                                                II-63
      IMS Chips (Germany)                                               II-64
      Micro Resist Technology GmbH (Germany)                            II-64
      Molecular Imprints, Inc. (US)                                     II-65
      Nanonex Corp. (US)                                                II-65
      NanoOpto Corp. (US)                                               II-65
      Nano-Terra, Inc. (US)                                             II-66
      NIL Technology ApS (Denmark)                                      II-66
      NTT Advanced Technology Corporation (Japan)                       II-66
      Obducat AB (Sweden)                                               II-67
      PROFACTOR GmbH (Austria)                                          II-67
      SET Corporation SA (France)                                       II-67
      Sigma-Aldrich Corp. (US)                                          II-68
      SUSS MicroTec AG (Germany)                                        II-68
      SVG Optronics Co., Ltd. (China)                                   II-69
      Toppan Photomasks, Inc. (US)                                      II-69
      Transfer Devices, Inc. (US)                                       II-69
      Vistec Electron Beam GmbH (Germany)                               II-70

  9. GLOBAL MARKET PERSPECTIVE                                          II-71
      Table 2: World Recent Past, Current & Future Analysis for
      Nanopatterning by Technology Type - Nanoimprint Lithography
      (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft
      Lithography, and Others), Scanning Probe Lithography, and
      Other Technologies Markets Independently Analyzed with Annual
      Sales in US$ Thousands for Years 2015 through 2022 (includes
      corresponding Graph/Chart)                                        II-71

      Table 3: World Historic Review for Nanopatterning by
      Technology Type - Nanoimprint Lithography (Hot Embossing
      Lithography, UV Nanoimprint Lithography, Soft Lithography, and
      Others), Scanning Probe Lithography, and Other Technologies
      Markets Independently Analyzed with Annual Sales in US$
      Thousands for Years 2009 through 2014 (includes corresponding
      Graph/Chart)                                                      II-72

      Table 4: World 14-Year Perspective for Nanopatterning by
      Technology Type - Percentage Share Breakdown of Dollar Sales
      for Nanoimprint Lithography (Hot Embossing Lithography, UV
      Nanoimprint Lithography, Soft Lithography, and Others),
      Scanning Probe Lithography, and Other Technologies Markets for
      Years 2009, 2016, and 2022 (includes corresponding
      Graph/Chart)                                                      II-73

      Table 5: World Recent Past, Current & Future Analysis for
      Nanopatterning by End-Use Application - Semiconductor & Other
      Microelectronics, and Other End-Use Application Markets
      Independently Analyzed with Annual Sales in US$ Thousands for
      Years 2015 through 2022 (includes corresponding Graph/Chart)      II-74

      Table 6: World Historic Review for Nanopatterning by End-Use
      Application - Semiconductor & Other Microelectronics, and
      Other End-Use Application Markets Independently Analyzed with
      Annual Sales in US$ Thousands for Years 2009 through 2014
      (includes corresponding Graph/Chart)                              II-75

      Table 7: World 14-Year Perspective for Nanopatterning by
      End-Use Application - Percentage Breakdown of Dollar Sales for
      Semiconductor & Other Microelectronics, and Other End-Use
      Application Markets for Years 2009, 2016, and 2022 (includes
      corresponding Graph/Chart)                                        II-76



 III. COMPETITIVE LANDSCAPE

     Total Companies Profiled: 35 (including Divisions/Subsidiaries - 37)

     The United States (10)
     Canada (1)
     Japan (6)
     Europe (17)
     - France (2)
     - Germany (7)
     - Spain (1)
     - Rest of Europe (7)
     Asia-Pacific (Excluding Japan) (2)
     Middle East (1)
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